This paper discusses a computerized Facilities Monitor and Control System, which has been in use for several years at Hewlett Packard's Cupertino Integrated Circuit Division. Over 350 transducers monitor the IC fabrication support systems such as deionized (DI) water, process gases, process environment, cleanroom equipment and environment, as well as systems which ensure industrial hygiene, safety and environmental compliance. Examples illustrate how the Facilities Monitor System information has been used to improve yield, diagnose process control problems, prevent contamination and improve the facilities, resulting in significant cost savings. This is accomplished by continuous real-time monitoring, historical data acquisition and analysis, trendlining, correlation studies and various levels of alarm notification.

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