A series of two-dimensional calculations are performed to determine particle fluxes to wafers in a stagnation flow configuration. Mechanisms that influenced particle deposition included convection, diffusion, sedimentation, and thermophoresis. Particle deposition patterns resulting from a uniform freestream concentration are compared with deposition patterns from a narrow particle beam.
Particle Deposition Onto a Flat Surface from a Point Particle Source
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Frank Stratmann, Heinz Fissan, Thomas Peterson; Particle Deposition Onto a Flat Surface from a Point Particle Source. Journal of the IEST 1 November 1988; 31 (6): 39–41. doi: https://doi.org/10.17764/jiet.1.31.6.n65256516m648901
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