Measurements of airborne concentrations and surface concentrations of submicron particles were made in two different semiconductor manufacturing cleanrooms. These measurements, made with an optical particle counter, a condensation nucleus counter, and a surface contamination optical monitor were used to determine the particle fluxes and the particle deposition velocities. The measurement data were compared with theoretical predictions of deposition due to gravity, diffusion, and electrostatic effects.
Deposition of Submicron Aerosol Particles During Integrated Circuit Manufacturing: Experiments
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Jin Wu, Robert Miller, Douglas Cooper, James Flynn, Douglas Delson, Robert Teagle; Deposition of Submicron Aerosol Particles During Integrated Circuit Manufacturing: Experiments. Journal of the IEST 1 January 1989; 32 (1): 27–45. doi: https://doi.org/10.17764/jiet.1.32.1.m52036842044n049
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