Particle removal using deionized clean water and centrifugal force (water rinsing) is an effective and commonly used method in the semiconductor industry. Understanding the flow field around the rotating waters is essential in determining the effectiveness and efficiency of the process. In this study, flow visualization is used to observe the jet trajectory and the flow pattern for different flow rates at different rotational speeds. The qualitative and quantitative results show that the rotating disk is completely covered with a water film only at certain values of the governing parameters. The second part of the study involves studying the shielding effect of the carrier on the flow pattern on the waters. The flow cannot be visualized or seen through the shielding. The flow pattern is therefore visualized with the aid of some chemicals (that react and leave a color pattern) on the surface of the water and in the water jet.

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