Major improvements in water purification processes for the semiconductor industry have been reported over the past several years. Improved quality control testing programs have been instituted in major semiconductor facilities throughout the world. More recently, the quality of water produced at the central purification facility, as well as distribution for point-of-use (POU), has been verified with continuous on-line instrumentation versus the time-dependent lab analysis.

This presentation will document the most recent data for ultrapure water measurement at the POU, including the actual rinsing process. The data indicate that further research and development is required for improving the quality of the water in the actual rinsing process. In previous reports, the quality of water has not been monitored in the actual rinsing process and therefore information recorded is not complete. The pure water at the use point must he continuously monitored and verified for best results in the wafer rinsing process.

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