Numerical simulation of gas flow, heat transfer, and particle transport in a horizontal diffusion is presented. The wafers are cooled by inlet cold gas convectively but heated by furnace wall radiatively. Gas velocity between the wafers appears to be small compared with the bulk gas flow. A significant cooling of the first wafer in the batch is observed. Trajectories of aerosol particles in the furnace are predicted by solving the corresponding Lagrangian equation of motion that includes effects of temperature, drag, lift, gravity, and Brownian motion. Particle transport and deposition on the wafers are evaluated using three-dimensional particle trajectories.

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